|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
|
89964
|
AIO Microservice
|
AIO Microservice |
8826 |
in Photoresist Coater Tracks
AIO MICROSERVICE DUAL TRACK COAT SYSTEM:Dual Track Coat System
|
1
|
|
|
F* |
Scotia, New York |
|
|
44185
|
Suss MicroTec
|
Suss MicroTec |
RESPECT 600 |
in Photoresist Coaters
BLE RESPECT AUTOMATIC PHOTORESIST COATER:Automatic Photoresist Coater
System is designed exclusively to coat and bake substrates using spinning and heating techniques. BLE was acquired by Suss Microtec
|
1
|
|
|
F* |
Scotia, New York |
|
|
44184
|
Suss MicroTec
|
Suss MicroTec |
Respect 600 |
in Photoresist Developers
BLE RESPECT AUTOMATIC PHOTORESIST DEVELOPER: System is designed exclusively to develop and bake substrates using spinning and heating techniques
BLE was acquired by Suss Microtec
|
1
|
|
|
F* |
Scotia, New York |
|
|
77000
|
Brewer Science
|
Brewer Science |
CEE 4000 |
in Photoresist Coater Tracks
BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM:Programmable Automated Coat/Bake Track System
|
2
|
|
|
F* |
Scotia, NY |
|
|
41529
|
Headway
|
Headway |
CB15 |
in Photoresist Coaters
HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER:Manual Photoresist Spin Coater
|
1
|
|
|
F* |
Scotia, New York |
|
|
9971
|
Headway
|
Headway |
P8X20-30 |
in Photoresist Coaters
Headway Research P8X20-30:AC Spindle Motor for AC-101 Photoresist Spinner, New
|
1
|
|
|
|
Plano, TX |
|
|
254472
|
SEMES
|
SEMES |
LOZIX |
in Photoresist Coaters
SEMES LOZIX, 300mm, s/n: EW-LO120121002:LOZIX H-SOH 4C
|
1
|
|
|
N* |
Malta, New York |
|
|
4005
|
Solitec
|
Solitec |
820-CB |
in Photoresist Develop Track Systems
SOLITEC AUTOMATIC TWO-STATION PHOTORESIST COAT & BAKE:Automatic Two-station Photoresist Coat & Bake
Designed to coat and soft bake semiconductor wafers.
|
1
|
|
|
F* |
Scotia, New York |
|
|
5026
|
Solitec
|
Solitec |
5110SJC |
in Photoresist Developers
SOLITEC SCRUBBER/HI PRESSURE SPRAY: Scrubber/Hi Pressure Spray
|
1
|
|
|
F* |
Scotia, New York |
|
|
4007
|
Solitec
|
Solitec |
820-PTDB |
in Photoresist Develop Track Systems
SOLITEC TEMPERATURE CONTROLLED POSITIVE DEVELOPER:Temperature Controlled Positive Developer with Hot Plate Bake
Designed to develop and hard bake semiconductor wafers.
|
1
|
|
|
F* |
Scotia, New York |
|
|
206300
|
Specialty Coating
|
Specialty Coating |
P3201 |
in Photoresist Coaters
SPECIALTY COATING SYSTEMS DIP COATER:Dip Coater
|
1
|
|
7,752.08 |
|
Scotia, New York |
|
|
206539
|
Specialty Coating
|
Specialty Coating |
G3-8 |
in Photoresist Coaters
SPECIALTY COATING SYSTEMS SPIN COATER 8":Spin Coater
|
1
|
|
4,501.21 |
|
Scotia, New York |
|
|
249036
|
Suss MicroTec
|
Suss MicroTec |
ACS200 Gen3 |
in Photoresist Coaters
Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm:Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm Suss spray coater
|
1
|
|
|
|
East Fishkill, New York |
|
|
42108
|
Suss MicroTec
|
Suss MicroTec |
FALCON - ACS 200 |
in Photoresist Coater/Developers
SUSS MICROTEC FALCON ACS 200:Fully Automated High Throughput Coating, Developing Cluster System
System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
|
1
|
|
|
F* |
Scotia, New York |
|
|
154092
|
Silicon Valley Group
|
Silicon Valley Group |
8136 |
in Photoresist Tools
SVG SILICON VALLEY GROUP SINGLE TRACK HOT PLATE OVEN:Single Track Hot Plate Oven
Silicon Valley Group 8136
|
1
|
|
5,201.39 |
|
Scotia, New York |
|
|
254475
|
Tel
|
Tel |
ACT12 |
in Photoresist Coaters
|
1
|
|
|
N* |
Singapore |
|
|
254137
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
250840
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
250841
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
250843
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
250839
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
250847
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
250842
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
250844
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
250846
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
250849
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
TEL ACT8, 200mm, sn: 9211869:TCDEV-24 JUSTIN ACT TRACK FOR 0.25um (former TCDEV-39)
|
1
|
|
|
|
Singapore |
|
|
254477
|
Tel
|
Tel |
LITHIUS PRO-I |
in Photoresist Coaters
|
1
|
|
|
N* |
Singapore |
|
|
254106
|
Tel
|
Tel |
Lithius ProV |
in Photoresist Coaters
|
1
|
|
|
|
Malta, New York |
|
|
254101
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V110231:Immersion Coat and Develop
|
1
|
|
|
|
Malta, New York |
|
|
254102
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V110233:Immersion Coat and Develop
|
1
|
|
|
|
Malta, New York |
|
|
254103
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V120318:Immersion Coat and Develop
|
1
|
|
|
|
Malta, New York |
|
|
254240
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
|
1
|
|
|
|
Malta, New York |
|
|
254242
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
251087
|
Tel
|
Tel |
MARK8 |
in Photoresist Coaters
|
1
|
|
|
|
Singapore |
|
|
254104
|
Tel
|
Tel |
PROi |
in Photoresist Coaters
TEL PROi, 300mm, s/n: N100355:Cot / DEV
|
1
|
|
|
|
Dresden, Saxony |
|
|
254241
|
Tel
|
Tel |
ProZ |
in Photoresist Coaters
|
1
|
|
|
|
Malta, New York |
|
|
249204
|
Tokyo Electron Limit
|
Tokyo Electron Limit |
LITHIUS I+ |
in Photoresist Coaters
TEL, LITHIUS I+, 300mm, S/N G481358:TEL, LITHIUS I+, 300mm, S/N G481358
|
1
|
|
|
|
Singapore |
|
|
233207
|
Tokyo Electron Ltd
|
Tokyo Electron Ltd |
Lithius |
in Photoresist Coaters
TEL, Lithius, 300mm, S/N G260815:TEL, Lithius, 300mm, S/N G260815
|
1
|
|
|
|
Singapore |
|
|
245289
|
Tokyo Electron Limit
|
Tokyo Electron Limit |
8181523 |
in Photoresist Coaters
TEL, Mark 8, 200mm, S/N 8181523:TEL, Mark 8, 200mm, S/N 8181523 SOG Coater. 2 coaters only.
|
1
|
|
|
|
Singapore |
|